Wafer surface cleaning for silicon homoepitaxy with and without ECR hydrogen plasma exposure
Name
32147490-MIT.pdf
Description
Full printable version
Size
8.38 MB
Format
Adobe PDF
Checksum (MD5)
a0daf4ca7bf12a8d4021eb399a6e521d
Author(s)
Kim, Hyoun-woo
Advisor(s)
Rafael Reif.
Date Issued
1994
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1994.
Includes bibliographical references (leaves 138-143).
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
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