Absorbance modulation optical lithography
Name
231635606-MIT.pdf
Description
Full printable version
Size
2.84 MB
Format
Adobe PDF
Checksum (MD5)
1cf11f8f00e6a51118ac62556de3db80
Author(s)
Tsai, Hsin-Yu Sidney
Advisor(s)
Henry I. Smith.
Alternative Title
AMOL
Date Issued
2007
Publisher
Massachusetts Institute of Technology
Abstract
In this thesis, the concept of absorbance-modulation optical lithography (AMOL) is described, and the feasibility experimentally verified. AMOL is an implementation of nodal lithography, which is not bounded by the diffraction limit of incident lights. Experimental results showed promising capability of AMOL and matched well with simulation. Several key elements of the AMOL system are discussed: the material systems of AMOL, limitations on the material and optical systems presented, and the design and fabrication of spiral phase elements that generate ring-shaped beams required by AMOL.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2007.
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Includes bibliographical references (p. 91-94).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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