Sub-20nm substrate patterning using a self-assembled nanocrystal template
Name
67766814-MIT.pdf
Description
Full printable version
Size
12.64 MB
Format
Adobe PDF
Checksum (MD5)
5e3de74e66348cd36a61e661fdc87afb
Author(s)
Tabone, Ryan C
Advisor(s)
Vladimir BuloviÄ.
Date Issued
2005
Publisher
Massachusetts Institute of Technology
Abstract
A hexagonally close-packed monolayer of lead selenide quantum dots is presented as a template for patterning with a tunable resolution from 2 to 20nm. Spin-casting and micro-contact printing are resolved as methods of forming and depositing these monolayers of quantum dots through self-assembly. Four methods of templated patterning - shadowmasking, lift-off, selective ablation & nano-imprinting - using the quantum dot self-assembled monolayer are proposed and explored. The nano-imprinting technique is used to produce the smallest pattern in anodized alumina to date. The use of this nano-patterned anodized alumina as an etch mask is discussed as a means of patterning substrates within the 2 to 20nm range. The physics behind the possible modification of silicon's electronic band gap due to our nano-patterning is also presented.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2005.
Includes bibliographical references (p. 105-110).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Persistent DSpace Link
