Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterened polysilicon
Name
39171343-MIT.pdf
Description
Full printable version
Size
20.82 MB
Format
Adobe PDF
Checksum (MD5)
5d09774898ef95c6d5f6cc7ee2678e1c
Author(s)
Chang, Jane Pei-chen, 1967-
Advisor(s)
Herbert H. Sawin.
Date Issued
1998
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1998.
Includes bibliographical references (p. 163-170).
Subjects
Chemical Engineering
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
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