Metrology of thin silicon expitaxial films : determination of epitaxial film thickness by Fourier-transform infra-red spectrometry
Name
33231086-MIT.pdf
Description
Full printable version
Size
1.51 MB
Format
Adobe PDF
Checksum (MD5)
6be60bcd055509da55ef434b473650d7
Author(s)
Cherkassky, Alexander (Alexander Peter), 1963-
Date Issued
1995
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.
Includes bibliographical references (leaf 47).
Subjects
Electrical Engineering and Computer Science
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Persistent DSpace Link
