The effect of low energy ion bombardment on the crystallographic orientation of thin films
Name
13782745-MIT.pdf
Description
Full printable version
Size
3.97 MB
Format
Adobe PDF
Checksum (MD5)
c5feb20b41d95780f2761b5cc9c7ca3b
Author(s)
Yu, Lock See
Advisor(s)
L. Rafael Reif.
Date Issued
1985
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1985.
MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.
Includes bibliographical references.
Subjects
Materials Science and Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
Persistent DSpace Link
