The effects of polydispersity on the morphology of polystyrene-polyferrocenyldimethylsilane block copolymer thin films
Name
630087841-MIT.pdf
Description
Full printable version
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5.58 MB
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Checksum (MD5)
2c71f7be57a1b8317b21a9d32fc80028
Author(s)
Perkinson, Joy C. (Joy Clare)
Advisor(s)
Caroline A. Ross.
Date Issued
2009
Publisher
Massachusetts Institute of Technology
Abstract
Introduction: As the size of electronic and magnetic devices decreases, nanoscale patterning becomes an increasingly important area of research. Two different approaches have been taken to pattern media: top-down methods such as lithography, and bottom-up methods such as self-assembly. Top-down assembly methods have the advantages of precision and accuracy, but are hard to scale for certain industrial applications due to their low throughput. Self-assembly methods are more easily scalable for applications requiring mass production. Thus, self-assembly has attracted attention and is an area of ongoing research for its potential to create high-throughput, periodic nanoscale patterns. Block copolymers are a class of commonly-studied materials for nanoscale selfassembly. Block copolymers are long molecules that consist of "blocks" of chemically differing polymers attached end-to-end. Under the right conditions, these blocks will phase separate, spontaneously forming periodic microdomains. Diblock copolymers, which have only two blocks, have been found to form a variety of well-ordered morphologies with nanoscale periodicity ...
Description
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2009.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 35).
Subjects
Materials Science and Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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