Novel process and apparatus design for metalorganic chemical vapor deposition (MOCVD) of superconducting thin films
Name
42996973-MIT.pdf
Description
Full printable version
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45.03 MB
Format
Adobe PDF
Checksum (MD5)
b2c8a2e3b8f5e978debe3394a704c154
Author(s)
Hubert, Brian Norio
Advisor(s)
John Vander Sande.
Date Issued
1996
Publisher
Massachusetts Institute of Technology
Abstract
In this work, a number of YBa2Cu3Ox-7 (YBCO) superconductor deposition systems developed by various laboratories are subjected to a critical review and analysis. Deficiencies in the design of these deposition processes, and deficiencies in the design of the mechanisms and tools used to carry out these processes are identified. Most of these deficiencies have resulted in either poor end-product performance or unlikely commercial viability. For example: pulsed laser deposition systems are capable of producing very high quality YBCO superconducting films, but their deposition rates are too slow to be commercially viable; liquidsource MOCVD systems can be precisely controlled, but the solvents they require tend to kill superconducting oxides; and solid-source MOCVD systems suffer from imprecise process control, thermal degradation of precursor materials, or both. A simple and affordable MOCVD system, called ConBrio, is proposed as an alternative to existing deposition systems.
Description
Thesis (S.B. and S.M.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996.
Includes bibliographical references (leaves 73-77).
Subjects
Mechanical Engineering
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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