Variation reduction in plasma etching via run-to-run process control and endpoint detection
Name
38551262-MIT.pdf
Description
Full printable version
Size
8.44 MB
Format
Adobe PDF
Checksum (MD5)
656c4d8a817c0ffcff40ca5cf79306da
Author(s)
Le, Minh Sy
Advisor(s)
Herbert H. Sawin.
Date Issued
1997
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1997.
Includes bibliographical references (leaves 89-91).
Subjects
Electrical Engineering and Computer Science
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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