Low-loss integrated photonics for the blue and ultraviolet regime
Name
1.5052502.pdf
Description
Published version
Size
1.42 MB
Format
Adobe PDF
Checksum (MD5)
890ca83df24ac9ff6e789b168f428287
Author(s)
West, Gavin Neal
Loh, William
Kharas, Dave
Sorace-Agaskar, Cheryl
Mehta, Karan Kartik
Sage, Jeremy M.
Chiaverini, John
Ram, Rajeev J
Date Issued
February 2019
Journal
APL Photonics
Publisher
AIP Publishing
Citation
West, Gavin N., et al. “Low-Loss Integrated Photonics for the Blue and Ultraviolet Regime.” APL Photonics 4, 2 (February 2019): 026101. © 2019 the Authors
Version
Final published version
Abstract
We present a low-loss integrated photonics platform in the visible and near ultraviolet (UV) regime. Fully etched waveguides based on atomic layer deposition (ALD) of aluminum oxide operate in a single transverse mode with <3 dB/cm propagation loss at a wavelength of 371 nm. Ring resonators with intrinsic quality factors exceeding 470 000 are demonstrated at 405 nm, and the thermo-optic coefficient of ALD aluminum oxide is estimated to be 2.75 × 10[superscript −5] (RIU/°C). Absorption loss is sufficiently low to allow on-resonance operation with intra-cavity powers up to at least 12.5 mW, limited by available laser power. Experimental and simulated data indicate that the propagation loss is dominated by sidewall roughness, suggesting that lower loss in the blue and UV is achievable.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Lincoln Laboratory
Terms of Use
Creative Commons Attribution 4.0 International license
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1063/1.5052502
