Carbon Nanotube Growth Using Ni Catalyst in Different Layouts
Name
AMMNS001.pdf
Size
12.01 KB
Format
Adobe PDF
Checksum (MD5)
10e077f151b144fba63b7832b76eea23
Author(s)
Nguyen, H. Q.
Krishnan, R.
Choi, K. W.
Thompson, Carl V.
Lim, F. Y.
Date Issued
January 2005
Series/Report no.
Advanced Materials for Micro- and Nano-Systems (AMMNS);
Abstract
Vertically aligned carbon nanotubes have been grown using Ni as catalyst by plasma enhanced chemical vapor deposition system (PECVD) in various pre-patterned substrates. Ni was thermally evaporated on silicon substrates with anodized alumina mask prepared in different methods including 2 step anodization of porous alumina template and interference lithography assisted array of pores. The templates helped to define Ni nanodots inside the pores which in turn catalyzed the growth of carbon nanotubes inside the PECVD system at temperature of 700-750C using mixture of ammonia and acetylene gases. The resulting well-aligned multi-walled carbon nanotubes were further investigated using SEM, TEM and Raman spectroscopy. The size, shape and structure of the grown carbon nanotubes were also discussed.
Subjects
Nickel
Carbon nanotubes
plasma enhanced chemical vapor deposition
Persistent DSpace Link
