Optical nanolithography with λ/15 resolution using bowtie aperture array
Name
339_2014_Article_8265.pdf
Size
1.1 MB
Format
Adobe PDF
Checksum (MD5)
b80733414924a17633ff5cbd8e4ddda7
Author(s)
Wen, Xiaolei
Srisungsitthisunti, Pornsak
Xu, Xianfan
Traverso, Luis M.
Moon, Euclid Eberle
Date Issued
January 2014
Journal
Applied Physics A
Publisher
Springer Berlin Heidelberg
Citation
Wen, Xiaolei et al. “Optical Nanolithography with λ/15 Resolution Using Bowtie Aperture Array.” Applied Physics A 117.1 (2014): 307–311.
Version
Author's final manuscript
Abstract
We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1007/s00339-014-8265-y
