UV-solvent annealing for morphology and orientation control in self-assembled PS-PDMS thin films
Name
Ross_UV-solvent.pdf
Size
2.06 MB
Format
Adobe PDF
Checksum (MD5)
d4dc0bf571864eba75ccf5ec11a6bc3f
Author(s)
Ntetsikas, K
Liontos, G
Avgeropoulos, A
Lee, Keehong
Kreider, Melissa E.
Bai, Wubin
Cheng, Li-Chen
Dinachali, Saman Safari
Tu, Kun-Hua
Huang, Tao
Date Issued
October 2016
Journal
Nanotechnology
Publisher
IOP Publishing
Citation
Lee, Keehong et al. "UV-solvent annealing for morphology and orientation control in self-assembled PS-PDMS thin films." Nanotechnology 27, 46 (October 2016): 465301 © 2016 IOP Publishing Ltd
Version
Final published version
Abstract
The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript PS] = 68%, M[subscript n] = 53 kg mol⁻¹), the other with PDMS block as majority (f[subscript PDMS] = 67%, M[subscript n] = 44 kg mol⁻¹). A 5 min UV irradiation was applied during solvent vapor annealing which led to both partial crosslinking of the polymer and a small increase in the temperature of the annealing chamber. This approach was effective for improving the correlation length of the self-assembled microdomain arrays and in limiting subsequent flow of the PDMS in the PDMS-majority BCP to preserve the post-anneal morphology. Ordering and orientation of microdomains were controlled by directed self-assembly of the BCPs in trench substrates. Highly-ordered perpendicular nanochannel arrays were obtained in the PDMS-majority BCP.
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
Creative Commons Attribution 3.0 Unported license
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1088/0957-4484/27/46/465301
