Microstructural modification of thin films and its relation to the electromigration-limited reliability of VLSI interconnects
Name
26408909-MIT.pdf
Description
Full printable version
Size
18.22 MB
Format
Adobe PDF
Checksum (MD5)
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Author(s)
Longworth, Hai Pham
Advisor(s)
Carl V. Thompson.
Date Issued
1992
Publisher
Massachusetts Institute of Technology
Description
Thesis (Sc. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1992.
Includes bibliographical references (leaves 246-262).
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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