A nanofabricated, monolithic, path-separated electron interferometer
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Agarwal_et_al-2017-Scientific_Reports.pdf
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Author(s)
Dyck, Dirk van
Agarwal, Akshay
Kim, Chungsoo
Hobbs, Richard
Berggren, Karl K
Date Issued
May 2017
Journal
Scientific Reports
Publisher
Nature Publishing Group
Citation
Agarwal, Akshay et al. "A nanofabricated, monolithic, path-separated electron interferometer." Scientific Reports 7, 1 (May 2017): 1677 © 2017 The Author(s)
Version
Final published version
Abstract
Progress in nanofabrication technology has enabled the development of numerous electron optic elements for enhancing image contrast and manipulating electron wave functions. Here, we describe a modular, self-aligned, amplitude-division electron interferometer in a conventional transmission electron microscope. The interferometer consists of two 45-nm-thick silicon layers separated by 20 μm. This interferometer is fabricated from a single-crystal silicon cantilever on a transmission electron microscope grid by gallium focused-ion-beam milling. Using this interferometer, we obtain interference fringes in a Mach-Zehnder geometry in an unmodified 200 kV transmission electron microscope. The fringes have a period of 0.32 nm, which corresponds to the [111] lattice planes of silicon, and a maximum contrast of 15%. We use convergent-beam electron diffraction to quantify grating alignment and coherence. This design can potentially be scaled to millimeter-scale, and used in electron holography. It could also be applied to perform fundamental physics experiments, such as interaction-free measurement with electrons.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
Creative Commons Attribution 4.0 International
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DOI of Published Version
https://doi.org/10.1038/s41598-017-01466-0
