Development of a nanomanufacturing line to support dip-pen nanolithography on a massive scale
Name
317304327-MIT.pdf
Description
Full printable version
Size
3.07 MB
Format
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Checksum (MD5)
8d72e6b2c10164dc6e88e2c17a8dd26a
Author(s)
Luttkus, Jessica (Jessica D.)
Advisor(s)
Martin L. Culpepper.
Date Issued
2008
Publisher
Massachusetts Institute of Technology
Abstract
A manufacturing line to support dip pen nanolithography on a massive scale is justified and described. Appropriate machines are evaluated based on key parameters such as cost, rate, and resolution. Methods for comparing lines are discussed, and solutions for lowest cost and fastest lines are provided.
Description
Thesis (S.B.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 2008.
Includes bibliographical references (p. 29).
Subjects
Mechanical Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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