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Selectively Micro-Patternable Fibers via In-Fiber Photolithography
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acscentsci.0c01188.pdf
Description
Published version
Size
3.36 MB
Format
Adobe PDF
Checksum (MD5)
0a6265d875f4c784e88e2fd05aff7297
Author(s) • • • • •
Lee, Youngbin
Canales, Andres
Loke, Gabriel
Kanik, Mehmet
Fink, Yoel
Anikeeva, Polina
Date Issued
2020
Journal
ACS Central Science
Publisher
American Chemical Society (ACS)
Citation
Lee, Youngbin, Canales, Andres, Loke, Gabriel, Kanik, Mehmet, Fink, Yoel et al. 2020. "Selectively Micro-Patternable Fibers via In-Fiber Photolithography." ACS Central Science, 6 (12).
Version
Final published version
Abstract
© Multimaterial fibers engineered to integrate glasses, metals, semiconductors, and composites found applications in ubiquitous sensing, biomedicine, and robotics. The longitudinal symmetry typical of fibers, however, limits the density of functional interfaces with fiber-based devices. Here, thermal drawing and photolithography are combined to produce a scalable method for deterministically breaking axial symmetry within multimaterial fibers. Our approach harnesses a two-step polymerization in thiol-epoxy and thiol-ene photopolymer networks to create a photoresist compatible with high-throughput thermal drawing in atmospheric conditions. This, in turn, delivers meters of fiber that can be patterned along the length increasing the density of functional points. This approach may advance applications of fiber-based devices in distributed sensors, large area optoelectronic devices, and smart textiles.
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
10.1021/ACSCENTSCI.0C01188