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  4. Optical gain and lasing from band-engineered Ge-on-Si at room temperature

Optical gain and lasing from band-engineered Ge-on-Si at room temperature

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Author(s)
Liu, Jifeng
•
Sun, Xiaochen
•
Camacho-Aguilera, Rodolfo Ernesto
•
Cai, Yan
•
Kimerling, Lionel C.
•
Michel, Jurgen
Date Issued
July 2010
Journal
Proceedings of the 2010 15th OptoeElectronics and Communications Conference (OECC)
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
Jifeng, Liu et al. "Optical gain and lasing from band-engineered Ge-on-Si at room temperature." 15th OptoElectronics and Communications Conference (OECC2010) Technical Digest, July 2010, Sapporo Convention Center, Japan. Copyright © 2010, by The Institute of Electronics, Information and Communication Engineers
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Final published version
Abstract
We present theoretical modeling and experimental results of optical gain and lasing from tensile-strained, n[superscript +] Ge-on-Si at room temperature. Compatible with silicon CMOS, these devices are ideal for large-scale electronic-photonic integration on Si.
MIT Department
MIT Materials Research Laboratory
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Massachusetts Institute of Technology. Microphotonics Center
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Persistent DSpace Link
http://hdl.handle.net/1721.1/79799
DOI of Published Version
http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=5588537
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