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  4. Large Area 1.2 kV GaN Vertical Power FinFETs with a Record Switching Figure-of-Merit

Large Area 1.2 kV GaN Vertical Power FinFETs with a Record Switching Figure-of-Merit

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sword-2019-07-01T13:30:51.original.xml (130 B)
Original SWORD entry document
Author(s)
Zhang, Yuhao
•
Sun, Min
•
Perozek, Joshua A.
•
Liu, Zhihong
•
Zubair, Ahmad
•
Piedra, Daniel
•
Chowdhury, Nadim
•
Gao, Xiang
•
Shepard, Kenneth
•
Palacios, Tomas
Date Issued
November 2018
Journal
IEEE Electron Device Letters
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
Zhang, Yuhao et al. "Large Area 1.2 kV GaN Vertical Power FinFETs with a Record Switching Figure-of-Merit." IEEE Electron Device Letters 40, 1 (January 2019): 75 - 78 © 2018 IEEE
Version
Author's final manuscript
Abstract
This letter presents the first experimental study on capacitances, charges, and power-switching figure of merits (FOM) for a large-area vertical GaN power transistor. A 1.2-kV, 5-A GaN vertical power FinFET was demonstrated in a chip area of 0.45 mm2, with a specific on-resistance of 2.1 mΩ·cm2 and a threshold voltage of 1.3 V. Device junction capacitances were characterized and their main components were identified. This was used to calculate the switching charges and practical switching frequencies. Device FOMs were then derived that take into account the trade-offs between the conduction and switching power losses. Our GaN vertical FinFETs exhibit high-frequency (MHz) switching capabilities and superior switching FOMs when compared with commercial 0.9-1.2-kV Si and SiC power transistors. This letter shows the great potential of GaN vertical FinFETs for next-generation medium-voltage power electronics.
MIT Department
Massachusetts Institute of Technology. Microsystems Technology Laboratories
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
Creative Commons Attribution-Noncommercial-Share Alike
http://creativecommons.org/licenses/by-nc-sa/4.0/
Persistent DSpace Link
https://hdl.handle.net/1721.1/121563
DOI of Published Version
https://doi.org/10.1109/led.2018.2880306
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