Deposition and characterization of very low pressure CVD silicon/silicon-germanium heteroepitaxial structures
Name
27782062-MIT.pdf
Size
88.57 MB
Format
Adobe PDF
Checksum (MD5)
1e91fd836b18befa03108f16a20ad545
Author(s)
Tsai, Curtis.
Date Issued
1992
Publisher
Massachusetts Institute of Technology
Description
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 1992
Includes bibliographical references (leaves 135-146).
Subjects
Electrical Engineering and Computer Science
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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MIT theses may be protected by copyright. Please reuse MIT thesis content according to the MIT Libraries Permissions Policy, which is available through the URL provided.
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