Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges
Name
15495986-MIT.pdf
Description
Full printable version
Size
18.97 MB
Format
Adobe PDF
Checksum (MD5)
fc305dbf2beaff0c4bee86117010466e
Author(s)
Allen, Kenneth Donald
Advisor(s)
Herbert H. Swain.
Date Issued
1986
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1986.
MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE.
Bibliography: leaves 319-340.
Subjects
Chemical Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
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