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Binary matrices of optimal autocorrelations as alignment marks

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Author(s)
Skirlo, Scott A.
•
Lu, Ling
•
Soljacic, Marin
Date Issued
February 2015
Journal
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Publisher
American Vacuum Society (AVS)
Citation
Skirlo, Scott A.; Lu, Ling and Soljačić, Marin. "Binary matrices of optimal autocorrelations as alignment marks." Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 33, no. 2 (February 2015).
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Author's final manuscript
Abstract
The authors define a new class of binary matrices by maximizing the peak-sidelobe distances in the aperiodic autocorrelations. These matrices can be used as robust position marks for in-plane translational spatial alignment. The optimal square matrices of dimensions up to 7 × 7 and optimal diagonally symmetric matrices of 8 × 8 and 9 × 9 were found by exhaustive searches.
MIT Department
Massachusetts Institute of Technology. Department of Physics
Terms of Use
Creative Commons Attribution-Noncommercial-Share Alike
http://creativecommons.org/licenses/by-nc-sa/4.0/
Persistent DSpace Link
http://hdl.handle.net/1721.1/108443
DOI of Published Version
https://doi.org/10.1116/1.4913316
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