High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
Name
Wen-2015-High throughput.pdf
Size
689.87 KB
Format
Adobe PDF
Checksum (MD5)
18a45fb211651d698737ed0bec126cc1
Author(s)
Wen, X.
Datta, A.
Traverso, L. M.
Pan, L.
Xu, X.
Moon, Euclid Eberle
Date Issued
November 2015
Journal
Scientific Reports
Publisher
Nature Publishing Group
Citation
Wen, X., A. Datta, L. M. Traverso, L. Pan, X. Xu, and E. E. Moon. “High Throughput Optical Lithography by Scanning a Massive Array of Bowtie Aperture Antennas at Near-Field.” Scientific Reports 5 (November 3, 2015): 16192.
Version
Final published version
Abstract
Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Terms of Use
Creative Commons Attribution
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1038/srep16192
