Fabrication of Two-Dimensional Photonic Crystals in AlGaInP/GaInP Membranes by Inductively Coupled Plasma Etching
Name
AMMNS007.pdf
Size
1.74 MB
Format
Adobe PDF
Checksum (MD5)
aad9eda7f6ba456d749488dc05ecd245
Author(s)
Chen, A.
Chua, Soo-Jin
Wang, B.
Fitzgerald, Eugene A.
Date Issued
January 2006
Series/Report no.
Advanced Materials for Micro- and Nano-Systems (AMMNS)
Abstract
The fabrication process of two-dimensional photonic crystals in an AlGaInP/GaInP multi-quantum-well membrane structure is developed. The process includes high resolution electron-beam lithography, pattern transfer into SiO₂ etch mask by reactive ion etching, pattern transfer through AlGaInP/GaInP layer by inductively coupled plasma (ICP) etching and a selective undercut wet etch to create the freestanding membrane. The chlorine-based ICP etching conditions are optimized to achieve a vertical sidewall. The photonic crystal structures with periods of a=160-480nm are produced.
Subjects
photonic crystals
ICP etching
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