Parallel Stitching of Two-Dimensional Materials
Name
Li_Parallel stitching.pdf
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3.46 MB
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Checksum (MD5)
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Author(s)
Lee, Yi-Hsien
Zhu, Yimei
Wu, Lijun
Ling, Xi
Lin, Yuxuan
Ma, Qiong
Wang, Ziqiang
Song, Yi
Yu, Lili
Huang, Shengxi
Alternative Title
Parallel Stitching of 2D Materials
Date Issued
January 2016
Journal
Advanced Materials
Publisher
John Wiley & Sons
Citation
Ling, Xi et al. “Parallel Stitching of 2D Materials.” Advanced Materials vol. 28, issue 12, March 2016, pp. 2322–2329.
Version
Original manuscript
Abstract
Diverse parallel stitched 2D heterostructures, including metal–semiconductor, semiconductor–semiconductor, and insulator–semiconductor, are synthesized directly through selective “sowing” of aromatic molecules as the seeds in the chemical vapor deposition (CVD) method. The methodology enables the large-scale fabrication of lateral heterostructures, which offers tremendous potential for its application in integrated circuits.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Massachusetts Institute of Technology. Department of Nuclear Science and Engineering
Massachusetts Institute of Technology. Department of Physics
Massachusetts Institute of Technology. Research Laboratory of Electronics
Terms of Use
Creative Commons Attribution-Noncommercial-Share Alike
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DOI of Published Version
https://doi.org/10.1002/adma.201505070
