Two-dimensional Photonic Crystals Fabricated by Nanoimprint Lithography
Name
AMMNS016.pdf
Size
165.78 KB
Format
Adobe PDF
Checksum (MD5)
c74d17abfef97f24726ee8b63b2db75a
Author(s)
Chen, A.
Chua, Soo-Jin
Fonstad, Clifton G. Jr.
Wang, B.
Wilhelmi, O.
Date Issued
January 2005
Series/Report no.
Advanced Materials for Micro- and Nano-Systems (AMMNS);
Abstract
We report on the process parameters of nanoimprint lithography (NIL) for the fabrication of two-dimensional (2-D) photonic crystals. The nickel mould with 2-D photonic crystal patterns covering the area up to 20mm² is produced by electron-beam lithography (EBL) and electroplating. Periodic pillars as high as 200nm to 250nm are produced on the mould with the diameters ranging from 180nm to 400nm. The mould is employed for nanoimprinting on the poly-methyl-methacrylate (PMMA) layer spin-coated on the silicon substrate. Periodic air holes are formed in PMMA above its glass-transition temperature and the patterns on the mould are well transferred. This nanometer-size structure provided by NIL is subjective to further pattern transfer.
Subjects
2-D photonic crystals
nanoimprinting
Ni mould fabrication
electron-beam lithography
electroplating
nanoimprint lithography
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