A novel white-light scanning interferometer for absolute nano-scale gap thickness measurement
Name
Xu-2009-A novel white-light scanning interferometer for absolute nano-scale gap thickness measurement.pdf
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Author(s)
Xu, Zhiguang
Youcef-Toumi, Kamal
Yoon, Soon Fatt
Date Issued
November 2009
Journal
2009 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Citation
Xu, Zhiguang et al. “A Novel White-light Scanning Interferometer for Absolute Nano-scale Gap Thickness Measurement.” IEEE, 2009. 97–98. © Copyright 2009 IEEE
Version
Final published version
Abstract
This paper presents a special configuration of white-light scanning interferometer, in which the measured gap is not located in any interference arm of the interferometer, but acts as an amplitude-and-phase modulator of the light source. Compared to the common white-light interferometer, the approach avoids the influence of the chromatic dispersion of the planar plates on the gap thickness measurement. It possesses a large measurement range of from several hundreds of nanometers to tens of microns as well as a high resolution of 0.1 nm, but does not employ any expensive equipment like spectrometer or monochromator. These advantages make our approach quite competent for the practical applications.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1109/OMEMS.2009.5338544
