Photonic topology optimization with semiconductor-foundry design-rule constraints
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constraint_paper (6).pdf
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Author(s) • • •
Hammond, Alec
Oskooi, Ardavan
Johnson, Steven G
Ralph, Stephen
Date Issued
June 2021
Journal
Optics Express
Publisher
The Optical Society
Citation
Hammond, Alec et al. "Photonic topology optimization with semiconductor-foundry design-rule constraints." Optics Express 29, 15 (June 2021): 23916-23938. © 2021 Optical Society of America
Version
Final published version
Abstract
We present a unified density-based topology-optimization framework that yields integrated photonic designs optimized for manufacturing constraints including all those of commercial semiconductor foundries. We introduce a new method to impose minimum-area and minimum-enclosed-area constraints, and simultaneously adapt previous techniques for minimum linewidth, linespacing, and curvature, all of which are implemented without any additional re-parameterizations. Furthermore, we show how differentiable morphological transforms can be used to produce devices that are robust to over/under-etching while also satisfying manufacturing constraints. We demonstrate our methodology by designing three broadband silicon-photonics devices for nine different foundry-constraint combinations.
MIT Department
Massachusetts Institute of Technology. Department of Mathematics
Terms of Use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1364/oe.431188