Global optimization for accurate determination of EBSD pattern centers
Name
1908.10692.pdf
Description
Submitted version
Size
1.36 MB
Format
Adobe PDF
Checksum (MD5)
d7355c9bd44f2ea69c99624a41b537aa
Author(s)
Pang, Edward L.
Larsen, Peter Mahler
Schuh, Christopher A
Date Issued
October 2019
Journal
Ultramicroscopy
Publisher
Elsevier BV
Citation
Pang, Edward L. et al., "Global optimization for accurate determination of EBSD pattern centers." Ultramicroscopy 209 (February 2020): 112876 doi. 10.1016/j.ultramic.2019.112876 ©2019 Authors
Version
Original manuscript
Abstract
Accurate pattern center determination has long been a challenge for the electron backscatter diffraction (EBSD) community and is becoming critically accuracy-limiting for more recent advanced EBSD techniques. Here, we study the parameter landscape over which a pattern center must be fitted in quantitative detail and reveal that it is both “sloppy” and noisy, which limits the accuracy to which pattern centers can be determined. To locate the global optimum in this challenging landscape, we propose a combination of two approaches: the use of a global search algorithm and averaging the results from multiple patterns. We demonstrate the ability to accurately determine pattern centers of simulated patterns, inclusive of effects of binning and noise on the error of the fitted pattern center. We also demonstrate the ability of this method to accurately detect changes in pattern center in an experimental dataset with noisy and highly binned patterns. Source code for our pattern center fitting algorithm is available online. ©2019 Elsevier B.V.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
Creative Commons Attribution-NonCommercial-NoDerivs License
Persistent DSpace Link
DOI of Published Version
https://doi.org/10.1016/J.ULTRAMIC.2019.112876
