On the development of a low-cost lithographic interferometer
Name
707936872-MIT.pdf
Description
Full printable version
Size
11.36 MB
Format
Adobe PDF
Checksum (MD5)
8c1d82c8efbe4f9791c93ad66bc4e1f7
Author(s)
Korre, Hasan
Advisor(s)
Karl K. Berggren.
Date Issued
2010
Publisher
Massachusetts Institute of Technology
Abstract
Interference lithography is a technique for making one- and two-dimensional periodic nanostructures using interference of two coherent light beams. Despite their successes, the size, maintenance, and cost of interference lithography tools have prevented periodic nanostructures from being ubiquitous in academia and industry. Here, a novel approach is described whereby the conventional optical source - a bulky and expensive metal-vapor laser - is replaced by a newly available, low-cost blue laser diode. Additionally, the passive alignment of a lens tube is utilized to simplify the construction of a spatial filter. The resulting custom-built interference lithography tool is able to print large-area (~ cm2 ) periodic patterns. The tool has a small footprint (~0.2 M2 ) and can be assembled for less than 6000 USD.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2010.
Cataloged from PDF version of thesis.
Includes bibliographical references (p. 61-63).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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reproduction or distribution in any format is prohibited without written
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