Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates
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Author(s)
Ross, Caroline A
Alexander-Katz, Alfredo
Bai, Wubin
Gadelrab, Karim Raafat
Date Issued
September 2015
Journal
Nano Letters
Publisher
American Chemical Society (ACS)
Citation
Bai, Wubin et al. “Perpendicular Block Copolymer Microdomains in High Aspect Ratio Templates.” Nano Letters 15.10 (2015): 6901–6908.
Version
Author's final manuscript
Abstract
Perpendicular orientation of lamellar microdomains in a high interaction parameter block copolymer was obtained within high aspect ratio gratings functionalized with a preferential sidewall brush. The experiments used polystyrene-block-polydimethylsiloxane (PS-b-PDMS) with molecular weight 43 kg/mol within trenches made using interference lithography. The perpendicular alignment was obtained for both thermal and solvent annealing, using three different solvent vapors, for a range of film thicknesses and trench widths. A platinum (Pt) layer at the base of the trenches avoided the formation of a wetting layer, giving perpendicular orientation at the substrate surface. The results are interpreted using self-consistent field theory simulation and a Ginzburg–Landau analytic model to map the energies of lamellae of different orientations as a function of the grating aspect ratio and the surface energies of the sidewalls and top and bottom surfaces. The model results agree with the experiment and provide a set of guidelines for obtaining perpendicular microdomains within topographic features.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1021/acs.nanolett.5b02815
