Temperature-dependent yield properties of passivated aluminum thin films on silicon wafers
Name
36152095-MIT.pdf
Description
Full printable version
Size
5.14 MB
Format
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Checksum (MD5)
51e94aff5cc1616a7db9ffcb1f556be0
Author(s)
Chu, Edison C. (Edison Chinghing)
Advisor(s)
Subra Suresh.
Date Issued
1996
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
Includes bibliographical references (p. 89-94).
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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