Characterization of LOCOS and oxidized mesa isolation in deep-sub micrometer SOI NMOS processes
Name
33342500-MIT.pdf
Description
Full printable version
Size
22.7 MB
Format
Adobe PDF
Checksum (MD5)
67e7b85a61e71c082abc76c97ce0a696
Author(s)
Thomas, Jeffrey Wade
Advisor(s)
James E. Chung.
Date Issued
1995
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.
Includes bibliographical references (leaves 76-77).
Subjects
Electrical Engineering and Computer Science
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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