Carbon nanotube assisted formation of sub-50 nm polymeric nano-structures
Name
317399798-MIT.pdf
Description
Full printable version
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12.46 MB
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Checksum (MD5)
5e48aa34f3563d29dcce31c740003a74
Author(s)
Lee, Chia-Hua
Advisor(s)
Karen K. Gleason.
Date Issued
2008
Publisher
Massachusetts Institute of Technology
Abstract
A novel processing method was developed for sub-50 nm structures by integrating quantum dots (QDs) on patterned polymer substrates. Poly(styrene-alt-maleic anhydride) (PSMa) was prepared by the initiated chemical vapor deposition (iCVD) method, an alternative to spin-on deposition. The sub-50 nm PSMa polymer patterns were prepared by low energy oxygen plasma etching by using CNTs as the masks. The water soluble, amine-functionalized QDs underwent the nucleophilic acyl substitution reaction with the PSMa containing anhydride functional groups. This integration method is use to incorporate high performance QDs on inexpensive, lightweight flexible substrate.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2008.
Includes bibliographical references (p. 39-43).
Subjects
Materials Science and Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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