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  5. Growth and characterization of low temperature silicon selective epitaxy

Growth and characterization of low temperature silicon selective epitaxy

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Author(s)
Yew, Tri-Rung
Advisor(s)
Rafael Reif.
Date Issued
1990
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1990.
Includes bibliographical references (leaves 204-210).
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
M.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission.
http://dspace.mit.edu/handle/1721.1/7582
Persistent DSpace Link
http://hdl.handle.net/1721.1/13640
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