A surface diffusion model for Dip Pen Nanolithography line writing
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A_surface_diffusion_model_for_Dip_Pen_Nanolithogra.pdf
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Author(s)
Saha, Sourabh Kumar
Culpepper, Martin
Date Issued
June 2010
Journal
Applied Physics Letters
Publisher
American Institute of Physics (AIP)
Citation
Saha, Sourabh K. and Martin L. Culpepper. “A Surface Diffusion Model for Dip Pen Nanolithography Line Writing.” Applied Physics Letters 96, 24 (June 14, 2010): 243105 © 2010 American Institute of Physics
Version
Final published version
Abstract
Dip Pen Nanolithography is a direct write process that creates nanoscale dots and lines. Models typically predict dot and line size via assumption of constant ink flow rate from tip to substrate. This is appropriate for dot writing. It is however well-known, though models rarely reflect, that the ink flow rate depends upon writing speed during line writing. Herein, we explain the physical phenomenon that governs line writing and use this to model tip-substrate diffusion in line writing. We accurately predict (i) the increase in flow rate with writing speed and (ii) line width within 12.5%.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1063/1.3454777
