Qualification of a medium current ion implantation system in a semiconductor production environment
Name
35953984-MIT.pdf
Description
Full printable version
Size
3.7 MB
Format
Adobe PDF
Checksum (MD5)
31d1720648a44e2fcb00160beb1bbc8c
Author(s)
Joung, Sandra K. (Sandra Kyongmee)
Advisor(s)
Lionel C. Kimerling.
Date Issued
1996
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1996.
Includes bibliographical references (p. 50-51).
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
Terms of Use
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