Simple fabrication of ultrahigh aspect ratio nanostructures for enhanced antireflectivity
Name
2014_JVSTBSimpleFabCones.pdf
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1.06 MB
Format
Adobe PDF
Checksum (MD5)
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Author(s)
Dominguez, Sagrario
Cornago, Ignacio
Bravo, Javier
Pérez-Conde, Jesus
Choi, Hyungryul J.
Kim, Jeong-Gil
Barbastathis, George
Date Issued
March 2014
Journal
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Publisher
American Vacuum Society
Citation
Dominguez, Sagrario, et al. “Simple Fabrication of Ultrahigh Aspect Ratio Nanostructures for Enhanced Antireflectivity.” Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, vol. 32, no. 3, May 2014, p. 030602. © 2014 American Vacuum Society
Version
Final published version
Abstract
In this work, the authors present a novel fabrication process to create periodic nanostructures with aspect ratio as high as 9.6. These nanostructures reduce spectral reflectance of silicon to less than 4% over the broad wavelength region from 200 to 2000 nm. At the visible range of the spectrum, from 200 to 650 nm, reflectivity is reduced to less than 0.1%. The aspect ratio and reflectance performance that the authors achieved have never been reported before for ordered tapered nanostructures, to our knowledge. © 2014 American Vacuum Society.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1116/1.4869302
