Real-time analysis and control of plasma etching via full wafer interferometry

Wong, Ka Shun

Real-time analysis and control of plasma etching via full wafer interferometry

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36398768-MIT.pdf

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Author(s)

Wong, Ka Shun

Advisor(s)

Duane S. Boning.

Date Issued

1996

Publisher

Massachusetts Institute of Technology

Description

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Mechanical Engineering, 1996.

Includes bibliographical references (p. 132-137).

Subjects

Mechanical Engineering

MIT Department

Massachusetts Institute of Technology. Department of Mechanical Engineering

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http://hdl.handle.net/1721.1/10682