Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy
Name
Lan-2010-Grids for Applications in High-Temperature High-Resolution.pdf
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2.86 MB
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Author(s)
Lan, Yucheng
Wang, Hui
Wang, Dezhi
Chen, Gang
Ren, Zhifeng
Date Issued
June 2010
Journal
Journal of Nanotechnology
Publisher
Hindawi Pub. Corp.
Citation
Lan, Yucheng, et al. “Grids for Applications in High-Temperature High-Resolution Transmission Electron Microscopy,” Journal of Nanotechnology, vol. 2010, Article ID 279608, 6 pages, 2010. © 2010 Hindawi Publishing Corporation.
Version
Final published version
Abstract
New TEM grids coated with ultrathin amorphous Al2O3 films have been developed using atomic layer deposition technique. The amorphous Al2O3 films can withstand temperatures over 600∘C in air and 900∘C in vacuum when the thickness of the Al2O3 film is 2 nm, and up to 1000∘C in air when the thickness is 25 nm, which makes heating TEM grids with nanoparticles up to 1000∘C in air and immediate TEM observation without interrupting the nanoparticles possible. Such coated TEM grids are very much desired for applications in high-temperature high-resolution transmission electron microscopy.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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DOI of Published Version
https://doi.org/10.1155/2010/279608
