General approach for the application of Supramolecular NanoStamping (SuNS) to surfaces of all types
Name
182723869-MIT.pdf
Description
Full printable version
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4.1 MB
Format
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Checksum (MD5)
5e96d7a0897f3c00e5c9afdb11d24188
Author(s)
Thévenet, Sarah
Advisor(s)
Francesco Stellacci.
Date Issued
2007
Publisher
Massachusetts Institute of Technology
Abstract
To novel ideas must correspond novel fabrication techniques, that enable the transfer of technologies from laboratories to the market. The success of microelectronics for example can not be separated from the success of the revolutionary manufacturing technology that has fed its expansion. The same is now true for nano- and biotechnologies that, to a large extent, have yet to find the technologies that will best answer their processing needs. The question is to find an approach that will enable the production of devices with the required resolution, complexity and versatility, together with the necessary reliability and potential for high-throughput. Supramolecular NanoStamping (SuNS), a DNA based lithography technique developed in our group, is trying to answer to this set of requirements. In this thesis, I present a new development in this lithography technique, expanding its application to a broad new range of substrates in a substrate-independent fashion. This work, which I conducted during the course of my master, proves the ability of SuNS to adapt to very diverse environments and applications.
Description
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2007.
Includes bibliographical references (leaves 77-83).
Subjects
Materials Science and Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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