Development of a simple, compact, low-cost interference lithography system
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Berggren-Development of a simple.pdf
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Author(s)
Korre, Hasan
Fucetola, Corey P.
Johnson, Jeremiah A.
Berggren, Karl K.
Date Issued
December 2010
Journal
Journal of Vacuum Science and Technology B Microelectronics and Nanometer Structures
Publisher
American Vacuum Society (AVS)
Citation
Korre, Hasan et al. “Development of a Simple, Compact, Low-cost Interference Lithography System.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 28.6 (2010): C6Q20. © 2010 American Vacuum Society
Version
Final published version
Abstract
Interference lithography (IL) has proven itself to be an enabling technology for nanofabrication. Within IL, issues of spatial phase distortion, fringe stability, and substrate development have been explored and addressed. However, IL tools are still unnecessarily expensive, large, and complex. To address these issues, the authors previously built a simple IL tool that used a blue laser diode to produce ∼ 300 nm pitch structures. The resulting patterned areas ( ∼ mm[superscript 2]) were limited by both the temporal and spatial coherence of the laser. Here, the authors report on the advancement of their low-cost interference lithography tool that makes use of newly available blue laser diodes and a simplified spatial filter to print larger-area ( ∼ cm[superscript 2]) patterns. With this configuration, the authors have designed and implemented a small-footprint ( ∼ 0.2 m[superscript 2]) Lloyd’s mirror IL tool that can be assembled for less than ∼ 6000 USD.
MIT Department
Massachusetts Institute of Technology. Department of Chemistry
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1116/1.3504498
