Technological assessment of light-trapping technology for thin-film Si solar cell
Name
567642878-MIT.pdf
Description
Full printable version
Size
1.19 MB
Format
Adobe PDF
Checksum (MD5)
43dd11515957538fa7ea5317050bfba4
Author(s)
Susantyoko, Rahmat Agung
Advisor(s)
Eugene A. Fitzgerald.
Date Issued
2009
Publisher
Massachusetts Institute of Technology
Abstract
The proposed light trapping technology of Distributed Bragg Reflector (DBR) with Diffraction Grating (DG) and Anti-Reflection Coating (ARC) for thin film Si solar cell was analyzed from the technology, market, and implementation perspectives. Two applications were investigated. For monocrystalline thin film Si solar cell, layer transfer technology is too expensive, while sliver Si technology is more applicable, but impossible to add DBR and DG structure on sliver Si that still attached on native wafer. For amorphous thin film Si solar cell, the cost model was created. Even though best-case assumptions were used, the cost/performance ratio of amorphous thin film Si equipped with proposed light trapping technology was still higher (worse) than incumbent amorphous thin film Si solar cell.
Description
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 2009.
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student submitted PDF version of thesis.
Includes bibliographical references (p. 47-48).
Subjects
Materials Science and Engineering.
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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