Growth, characterization and thermal stability of undoped and in-situ doped silicon-germanium heteroepitaxial layers
Name
28899012-MIT.pdf
Description
Full printable version
Size
14.21 MB
Format
Adobe PDF
Checksum (MD5)
79541cb166e54427a53b9ae8b72c89ff
Author(s)
Jang, Syun-Ming
Advisor(s)
Rafael Reif.
Date Issued
1993
Publisher
Massachusetts Institute of Technology
Description
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1993.
Includes bibliographical references (leaves 186-196).
Subjects
Materials Science and Engineering
MIT Department
Massachusetts Institute of Technology. Department of Materials Science and Engineering
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