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  4. Reactivation of sub-bandgap absorption in chalcogen-hyperdoped silicon

Reactivation of sub-bandgap absorption in chalcogen-hyperdoped silicon

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Author(s)
Newman, Bonna Kay
•
Buonassisi, Tonio
•
Sher, Meng-Ju
•
Mazur, Eric
Date Issued
June 2011
Journal
Applied Physics Letters
Publisher
American Institute of Physics (AIP)
Citation
Newman, Bonna K. et al. “Reactivation of Sub-bandgap Absorption in Chalcogen-hyperdoped Silicon.” Applied Physics Letters 98.25 (2011): 251905. © 2011 American Institute of Physics
Version
Final published version
Abstract
Silicon doped with nonequilibrium concentrations of chalcogens using a femtosecond laser exhibits near-unity absorption of sub-bandgap photons to wavelengths of at least 2500 nm. Previous studies have shown that sub-bandgap absorptance decreases with thermal annealing up to 1175 K and that the absorption deactivation correlates with chalcogen diffusivity. In this work, we show that sub-bandgap absorptance can be reactivated by annealing at temperatures between 1350 and 1550 K followed by fast cooling (>50 K/s). Our results suggest that the defects responsible for sub-bandgap absorptance are in equilibrium at high temperatures in hyperdoped Si:chalcogen systems.
MIT Department
Massachusetts Institute of Technology. Department of Mechanical Engineering
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Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
Persistent DSpace Link
http://hdl.handle.net/1721.1/78013
DOI of Published Version
https://doi.org/10.1063/1.3599450
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