Drawing and Sketching: Art, Psychology, and Computer Graphics
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3736539.3737503.pdf
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529.11 KB
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Adobe PDF
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64ab755bb246b3b5c3b2c09882bb0865
Author(s)
Vinker, Yael
Tang, Mia
Hertzmann, Aaron
Fan, Judith
Agrawala, Maneesh
Chandra, Kartik
Fu, Hongbo
Schaldenbrand, Peter
Publisher
ACM|Special Interest Group on Computer Graphics and Interactive Techniques Conference
Citation
Yael Vinker, Mia Tang, Aaron Hertzmann, Judith Ellen Fan, Maneesh Agrawala, Kartik Chandra, Hongbo Fu, and Peter Schaldenbrand. 2025. Drawing and Sketching: Art, Psychology, and Computer Graphics. In Proceedings of the Special Interest Group on Computer Graphics and Interactive Techniques Conference Frontiers (SIGGRAPH Frontiers '25). Association for Computing Machinery, New York, NY, USA, Article 13, 1–3.
Version
Final published version
Abstract
Sketching is a fundamental form of expression that supports visual thinking, conceptual exploration, and communication across cultures, generations, and disciplines [Fan et al. 2023; Goel 1995; Hertzmann 2021; Tversky 2002; 2011; Tversky et al. 2003]. Whether through quick marks or detailed renderings, it externalizes ideas into tangible visual form, serving as both a creative act and a cognitive tool. For example, designers use sketches to explore new ideas [Goldschmidt 1992; Tversky et al. 2003], scientists employ them to formulate problems [Kaiser 2019; Nasim 2019], and children engage in sketching to learn and express themselves [Fiorella and Kuhlmann 2020; Forbus et al. 2011]. This central role has made drawing and sketching a long-standing topic of interest in computer graphics, computer vision, and machine learning [Bénard and Hertzmann 2018; Berger et al. 2013; Canny 1986; DeCarlo et al. 2003; Ha and Eck 2017; Hertzmann 2003; Judd et al. 2007; Vinker et al. 2022; Winnemöller et al. 2012; Xie and Tu 2017; Xu et al. 2020].
Description
SIGGRAPH Frontiers ’25, Vancouver, BC, Canada
MIT Department
Massachusetts Institute of Technology. Computer Science and Artificial Intelligence Laboratory
Terms of Use
Article is made available in accordance with the publisher's policy and may be subject to US copyright law. Please refer to the publisher's site for terms of use.
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DOI of Published Version
https://doi.org/10.1145/3736539.3737503
