Electroactive Nanoporous Metal Oxides and Chalcogenides by Chemical Design
Name
acs.chemmater.7b00464.pdf
Description
Published version
Size
4.34 MB
Format
Adobe PDF
Checksum (MD5)
8d3c2a8fed092c41eb12e80ed1ae79ef
Author(s)
Hendon, Christopher H
Butler, Keith T.
Ganose, Alex M.
Román-Leshkov, Yuriy
Scanlon, David O.
Ozin, Geoffrey A.
Walsh, Aron
Date Issued
March 2017
Journal
Chemistry of Materials
Publisher
American Chemical Society (ACS)
Citation
Hendon, Christopher H. et al., "Electroactive Nanoporous Metal Oxides and Chalcogenides by Chemical Design." Chemistry of Materials 29, 8 (April 2017): p. 3663–70 doi. 10.1021/acs.chemmater.7b00464 ©2017 Authors
Version
Final published version
Abstract
The archetypal silica- and aluminosilicate-based zeolite-type materials are renowned for wide-ranging applications in heterogeneous catalysis, gas-separation and ion-exchange. Their compositional space can be expanded to include nanoporous metal chalcogenides, exemplified by germanium and tin sulfides and selenides. By comparison with the properties of bulk metal dichalcogenides and their 2D derivatives, these open-framework analogues may be viewed as three-dimensional semiconductors filled with nanometer voids. Applications exist in a range of molecule size and shape discriminating devices. However, what is the electronic structure of nanoporous metal chalcogenides? Herein, materials modeling is used to describe the properties of a homologous series of nanoporous metal chalcogenides denoted np-MX2, where M = Si, Ge, Sn, Pb, and X = O, S, Se, Te, with Sodalite, LTA and aluminum chromium phosphate-1 structure types. Depending on the choice of metal and anion their properties can be tuned from insulators to semiconductors to metals with additional modification achieved through doping, solid solutions, and inclusion (with fullerene, quantum dots, and hole transport materials). These systems form the basis of a new branch of semiconductor nanochemistry in three dimensions. ©2017 American Chemical Society.
MIT Department
Massachusetts Institute of Technology. Department of Chemical Engineering
Terms of Use
Creative Commons Attribution 4.0 International license
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DOI of Published Version
https://doi.org/10.1021/ACS.CHEMMATER.7B00464
