Doubling of block copolymer line patterns by electron-beam-fabricated templates
Name
933249791-MIT.pdf
Description
Full printable version
Size
5.92 MB
Format
Adobe PDF
Checksum (MD5)
8c28a6f827cd09a7f84fd391f7fd183d
Author(s)
Oser, Kameron L
Advisor(s)
Karl K. Berggren.
Alternative Title
Doubling of BCP line patterns by electron-beam-fabricated templates
Date Issued
2015
Publisher
Massachusetts Institute of Technology
Abstract
The doubling of block copolymer (BCP) line patterns by electron-beam-fabricated template patterns is presented. Difficulties in achieving low defect self-assembly within the narrow line patterns are discussed. To address these issues, experimental approaches were investigated of narrowing the polymer's minority block through solvent annealing, and adjusting length of the polymer brush responsible for functionalizing the template lines. While narrowed polymer lines were not achieved through solvent annealing, low defect self-assembly of BCP within doubling template patterns was achieved by utilizing a polymer brush of high molecular weight (28 kg mol -1).
Description
Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, February 2015.
"September 2014." Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 54-58).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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