A dual-laser interferometry system for thin film measurements in thermal vapor deposition applications
Name
871171491-MIT.pdf
Description
Full printable version
Size
9.44 MB
Format
Adobe PDF
Checksum (MD5)
39d9fdae241f4965d44753e1f1ab70eb
Author(s)
Yin, Allen Shiping
Advisor(s)
Marc A. Baldo.
Date Issued
2012
Publisher
Massachusetts Institute of Technology
Abstract
Lithography processes harnessing the phase change of the chemically inert carbon dioxide as a resist have been shown as a possible alternative to patterning thin film organic semiconductors and metals. The ability to control the resist's growth would make the lithography process more reliable and ecient. This thesis seeks to control and observe the physical properties of the carbon dioxide resist via the optical technique of dual-laser interferometry in conjunction with a quartz crystal micro balance (QCMB).
Description
Thesis: M. Eng., Massachusetts Institute of Technology, Department of Electrical Engineering and Computer Science, 2012.
This electronic version was submitted by the student author. The certified thesis is available in the Institute Archives and Special Collections.
Cataloged from student-submitted PDF version of thesis.
Includes bibliographical references (pages 91-92).
Subjects
Electrical Engineering and Computer Science.
MIT Department
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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