Applying run-by-run process control to chemical-mechanical planarization and assessing insertion costs versus benefits of CMP
Name
33213921-MIT.pdf
Description
Full printable version
Size
12.39 MB
Format
Adobe PDF
Checksum (MD5)
44b68c5bc6715814c1054fcd042bc397
Author(s)
Altman, Arthur H
Advisor(s)
Duane Boning, Jeffrey A. Barks.
Date Issued
1995
Publisher
Massachusetts Institute of Technology
Description
Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1995, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995.
Includes bibliographical references (p. 87-89).
Subjects
Sloan School of Management
Electrical Engineering and Computer Science
MIT Department
Sloan School of Management
Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
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